MOSFET - Composition

Composition

Usually the semiconductor of choice is silicon, but some chip manufacturers, most notably IBM and Intel, recently started using a chemical compound of silicon and germanium (SiGe) in MOSFET channels. Unfortunately, many semiconductors with better electrical properties than silicon, such as gallium arsenide, do not form good semiconductor-to-insulator interfaces, thus are not suitable for MOSFETs. Research continues on creating insulators with acceptable electrical characteristics on other semiconductor material.

In order to overcome the increase in power consumption due to gate current leakage, a high-κ dielectric is used instead of silicon dioxide for the gate insulator, while polysilicon is replaced by metal gates (see Intel announcement).

The gate is separated from the channel by a thin insulating layer, traditionally of silicon dioxide and later of silicon oxynitride. Some companies have started to introduce a high-κ dielectric + metal gate combination in the 45 nanometer node.

When a voltage is applied between the gate and body terminals, the electric field generated penetrates through the oxide and creates an "inversion layer" or "channel" at the semiconductor-insulator interface. The inversion channel is of the same type, p-type or n-type, as the source and drain, thus it provides a channel through which current can pass. Varying the voltage between the gate and body modulates the conductivity of this layer and thereby controls the current flow between drain and source.