Photoresist Photoresist Categories

Some articles on categories, photoresist, photoresists:

Semiconductor Growth - Processing
... device fabrication, the various processing steps fall into four general categories deposition, removal, patterning, and modification of electrical properties ... The photoresist is exposed by a stepper, a machine that focuses, aligns, and moves the mask, exposing select portions of the wafer to short wavelength light ... After etching or other processing, the remaining photoresist is removed by plasma ashing ...
Some Common Photoresists
... The general mechanism of exposure for these photoresists proceeds with the decomposition of diazoquinone, i.e ...
Compact Disc Manufacturing - Mastering - Photoresist Mastering
... Photoresist mastering uses a light-sensitive material (a photoresist) to create the pits and lands on the CD master blank ... When exposed to the laser light, the photoresist undergoes a chemical reaction which hardens it ... The exposed area is then soaked in a developer solution which removes the exposed positive photoresist or the unexposed negative photoresist ...
Contact Lithography - Operating Principle
... coated with a thin film of UV-sensitive photoresist ... Photoresist lying beneath transparent glass is exposed, and becomes able to be dissolved by a developer, while photoresist lying under Chrome did not receive any UV ... Upon exiting the photomask-photoresist interface, the image-forming light is subject to near-field diffraction as it propagates through the photoresist ...
Techniques Comprising Computational Lithography - Complex Modeling of The Lens System and Photoresist
... on of the lens pupil Jones matrix of the stepper lens optical parameters of the photoresist stack diffusion through the photoresist stepper illumination control variables ...

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