Electron Beam-induced Deposition

Electron Beam-induced Deposition

Electron beam-induced deposition (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope that results in high spatial accuracy (below one nanometer) and possibility to produce free-standing, three-dimensional structures.

Read more about Electron Beam-induced DepositionProcess, Deposition Mechanism, Spatial Resolution, Materials and Precursors, Advantages, Disadvantages, Ion Beam-induced Deposition, Shapes

Other related articles:

Electron Beam-induced Deposition - Shapes
... Nanostructures of virtually any 3-dimensional shape can be deposited using computer-controlled scanning of electron beam ... Only the starting point has to be attached to the substrate, the rest of the structure can be free standing ...